SYSTEM FOR ABSORBING GASEOUS FLUORINE COMPOUNDS GENERATED IN CHEMICAL VAPOR DEPOSITION (CVD) IN ALKALI SOLUTION WITHOUT GENERATING OXYGEN DIFLUORIDE (OF2) GAS

摘要

PURPOSE: A system for treating fluorine compounds is provided to treat fluorine compound gas without generation of oxygen difluoride (OF2) gas by reacting the converted hydrogen fluoride gas with alkali absorption liquid after converting fluorine (F2) gas into hydrogen fluoride (HF) gas. CONSTITUTION: The fluorine compound treating system comprising a horizontal type airtight cylinder body(10) on an end part of one side surface of which gas inlet(10a) connected to gas inflow line(111) is formed, and on an end part of the other side surface of which gas outlet(10b) connected to gas outflow line(113) is formed; an absorption liquid storage tank(11) installed on the bottom of the horizontal type airtight cylinder body to store absorption liquid; absorption liquid injectors(13) installed on an upper part of the horizontal type airtight cylinder body; an absorption liquid circulation line(15) for connecting the absorption liquid storage tank and the absorption liquid injectors; a pump(17) installed in the middle of the absorption liquid circulation line to circulate alkali absorption liquid in the absorption liquid storage tank to the absorption liquid injectors; and a blower(115) installed in the middle of the gas outflow line to discharge the fluorine compounds to an external air after passing fluorine compounds through the horizontal type airtight cylinder body, wherein a gas conversion means is installed between the gas inlet and the gas inflow line of the horizontal type airtight cylinder body, and the gas conversion means comprises a vertical type airtight cylinder body(20) on an upper part of one side surface of which gas inlet(20a) is formed, on a lower part of the other side surface of which gas outlet(20b) is formed, and in which a "W" character cross sectional shaped channel(20c) is formed in an upper stream of the gas outlet by two partitions(21); a steam injector(210) installed under the gas inlet of the vertical type airtight cylinder body; first contact part(220) installed under the steam injector; first water injector(230) installed under the first contact part to inject water in a vertical direction; second contact part(240) installed under the first water injector; second water injector(250) installed under the second contact part to inject water upward; third contact part(260) installed under the second water injector and installed between the two partitions of the "W" character cross sectional shaped channel; fourth contact parts(270) respectively installed between the partitions of the "W" character cross sectional shaped channel and the vertical type airtight cylinder body; and third water injectors(280) installed above the fourth contact parts to inject water downward.