发明名称 SLIT DYE AND METHOD AND DEVICE FOR MANUFACTURING BASE HAVING COATING FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a slit die which can gain a gap precision between lips easily and can form an even coating film with a high precision of coating film thickness, and a method and a device for manufacturing a base having the coating film using the slit die. <P>SOLUTION: The slit die 1 having a lip gap and a port of a coating liquid formed at the lower end of the gap between the lips by combining a pair of facing lips, in which at least one lip is put on in the vertical direction, consists of at least two blocks 4 and 5 capable of shifting relatively in the right-angled long direction of the above port, and is composed of a block engaging element 8 for engaging capable of adjusting a relative position of these blocks, a block combining element 9 combining these blocks with each other after adjusting the relative position, a position determining element 10 installed on an outer surface opposite to the above port and regulating the position of the relative shift of the blocks and a position determining element-fixing element 20 fixing the position determining element. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004283820(A) 申请公布日期 2004.10.14
申请号 JP20040055860 申请日期 2004.03.01
申请人 TORAY IND INC 发明人 KAWATAKE HIROSHI;KITAMURA YOSHIYUKI
分类号 G02B5/20;B05C5/02;B05D1/26;(IPC1-7):B05C5/02 主分类号 G02B5/20
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