| 摘要 |
PROBLEM TO BE SOLVED: To provide an endpoint detection method of plasma treatment and a plasma monitor system which can respond to the deviation of luminescence wavelngth by a simple constitution using a band-pass filter, to improve monitoring accuracy and to realize cost reduction. SOLUTION: The endpoint detection method of plasma treatment consists of a transparent process using a band-pass filter which penetrates selectively a specified wavelength region only, in the whole region of a plasma light source, at a plurality of points of a monitoring plasma light source; a signalized process which signalizes and outputs a plurality of spectra penetrated in the transparent process; a detection output control process which performs operation process and adjustment of information such as light volume and wavelength about a plurality of output signals signalized in the signalized process; and a centralized control process which receives adjustment data adjusted in the detection output control process, performs operation process of information such an average value of each datagram, tendency, rate, change, etc. and outputs the endpoint of plasma treatment to output equipment. COPYRIGHT: (C)2005,JPO&NCIPI
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