| 摘要 |
PROBLEM TO BE SOLVED: To simply and precisely measure a thickness of a very thin sample. SOLUTION: This method of the present invention comprises a process for calculating sample thickness dependency of at least one diffraction spot intensity ratio drawn out based on scattering cross-sectional area and crystal structure of a measured substance, and based on an electron beam emitting direction, a process for convergence-emitting an electron beam to a desired area of the measured substance, and for measuring two or more of diffraction spot intensities corresponding to the diffraction spot intensity ratio out of a plurality of diffraction spots corresponding to a crystal face space and the direction of the transmission-diffracted electron beam, so as to find the diffraction spot intensity ratio, and a process for determining the thickness of the sample to conform a diffraction spot intensity ratio drawn out by calculation with the diffraction spot intensity ratio obtained by an experiment. COPYRIGHT: (C)2005,JPO&NCIPI
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