发明名称 SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE AND ITS MANUFACTURING PROCESS, CIRCUIT BOARD AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To prevent or control delamination of a resin layer in a semiconductor wafer, a semiconductor device and its manufacturing process, a circuit board and an electronic apparatus. <P>SOLUTION: The semiconductor device has a semiconductor chip 40 in which an integrated circuit 12 and wiring for electrical connection with the integrated circuit 12 are formed and including a pad 16, i.e. part of the wiring, on the surface. The semiconductor device comprises a rewiring layer 22 connected electrically with the pad 16, an external terminal 26 provided above the rewiring layer 22 while being connected electrically therewith, and a resin layer 30 provided to reach the side face of the semiconductor chip 40 while surrounding the external terminal 26. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004288816(A) 申请公布日期 2004.10.14
申请号 JP20030078097 申请日期 2003.03.20
申请人 SEIKO EPSON CORP 发明人 OHIGATA TAKAYOSHI
分类号 H01L23/29;H01L21/60;H01L21/78;H01L23/12;H01L23/31;H01L23/485 主分类号 H01L23/29
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