EXPOSURE APPARATUS AND EXPOSURE SYSTEM EQUIPPED WITH SAME

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus which can suppress decrease in the total pitch accuracy to the minimum. SOLUTION: After a drive stage 34 of an exposure stage 32 positions a substrate 51 with a photosensitive material at a first exposure position by moving a chuck stage 33, an irradiation optical system 40 irradiates the substrate 51 with exposure light through a mask 36. Then the drive stage 34 of the exposure stage 32 shifts the chuck stage 33 stepwise in a step shift amount L to position the substrate 51 with the photosensitive material at a second exposure position, and the irradiation optical system 40 irradiates the substrate 51 with exposure light through the mask 36. A controlling apparatus 47 corrects the step shift amount L of the chuck stage 33 on the basis of the temperature of the substrate 51 detected by a temperature detecting apparatus 48 attached to the exposure stage 32. COPYRIGHT: (C)2005,JPO&NCIPI