| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to take the place of the substrate in containing the liquid in the liquid supply system during substrate exchange. COPYRIGHT: (C)2005,JPO&NCIPI
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| 申请公布号 |
JP2004289128(A) |
申请公布日期 |
2004.10.14 |
| 申请号 |
JP20030417261 |
申请日期 |
2003.11.11 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
ANTONIUS THEODORUS ANNA MARIA DERKSEN;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;LOF JOERI;LOOPSTRA ERIK ROELOF;MERTENS JEROEN JOHANNES SOPHIA M;MULKENS JOHANNES CATHARINUS HUBERTUS;SENGERS TIMOTHEUS FRANCISCUS;STRAAIJER ALEXANDER;STREEFKERK BOB |
| 分类号 |
G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
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