发明名称 SEMICONDUCTOR SUBSTRATE DAMAGE PROTECTION SYSTEM
摘要 A method and apparatus for preventing substrate damage in a factory interface. In one embodiment, a method for preventing substrate damage in a factory interface includes the steps of receiving an indicia of potential substrate damage, and automatically preventing substrates from moving out of a substrate storage cassette in response to the received indicia. The indicia may be a seismic warning signal, among others. In another embodiment, a method for preventing substrate damage in a factory interface includes the steps of moving a pod door in a first direction to a position spaced-apart and adjacent a pod, and moving the pod door laterally in a second direction to close the pod. The lateral closing motion of the pod door urges substrates, which may be misaligned in the pod, into a predefined position within the pod.
申请公布号 WO2004008505(A3) 申请公布日期 2004.10.14
申请号 WO2003US22367 申请日期 2003.07.17
申请人 APPLIED MATERIALS, INC. 发明人 CHO, SUNGMIN;REIMER, PETER;SEIDL, VINCENT
分类号 B65G49/07;H01L21/00;H01L21/02;H01L21/673;H01L21/677;H01L21/68 主分类号 B65G49/07
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