METHOD FOR MANUFACTURING A SHADOW -MASK

摘要

A method for manufacturing a shadow- mask is hereby provided. The method comprises a step for preparing a shadow mask in which an outermost slsit of a standard column and an outermost slit of each of columns next to the standard column are located over a curvature of an effective portion's long side and a plurality of complete slits are located in the center portion of the effective portion; determining whether an unvenness between the outermost slits is not greater than 25%; and if the unevenness is greater than 25%, reducing the unvenness to a level below 25%.