| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist stripping composition having excellent stripping property and removing property, excellent corrosion resistance against a metal wiring material, and suppressing corrosion of the metal wiring material even in a washing process after stripping, and to provide a method for stripping a photoresist by using the above composition. SOLUTION: The nonwater-based resist stripping composition contains: (A) at least one kind of compound expressed by general formula (1); (B) at least one kind of organic amine selected from a group comprising monoisopropanol amine and diglycol amine; and (C) a polar organic solvent. In general formula (1), R<SP>1</SP>to R<SP>4</SP>areidentical or different and each represents a hydrogen atom, lower alkyl group, hydroxyl group, carboxyl group, hydroxyalkyl group, alkoxyl group, halogen atom or amino group. COPYRIGHT: (C)2005,JPO&NCIPI |
