| 摘要 |
PROBLEM TO BE SOLVED: To form a microcrystal thin film of proper quality at low temperature by little number of times. SOLUTION: Positive ion and negative ion are supplied onto a workpiece W, and a microcrystal thin film is formed on the workpiece W by utilizing generated energy when these positive ion and negative ion are recombined. Here, a plasma is generated by using high frequency power which is pulse modulated at a predetermined duty ratio. Thus, since a sheath is vanished at pulse OFF time and the negative ion generated by the plasma reaches the surface of the material to be treated, the negative ion can be effectively put to a practical use to form a film. COPYRIGHT: (C)2005,JPO&NCIPI
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