发明名称 METHOD OF HEAT TREATMENT OF SINGLE CRYSTAL SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To ensure high flatness in an atomic level on the surface of a TiO<SB>2</SB>rutile single crystal substrate. SOLUTION: The TiO<SB>2</SB>rutile single crystal substrate selected from surface orientation (110), (100), (001), (111) and (101) is cleaned with an organic solvent. After cleaning is performed with an acid solvent, calcination is carried out for one hour by using an electric furnace at a heating temperature of about 300-1,100<SP>o</SP>C under atmospheric pressure. Consequently, a structure is obtained which has an atomic step 2 and a terrace 1 of about 0.22-0.46nm in height on the surface of the TiO<SB>2</SB>rutile single crystal substrate of the selected surface orientation. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004288767(A) 申请公布日期 2004.10.14
申请号 JP20030077151 申请日期 2003.03.20
申请人 JAPAN SCIENCE & TECHNOLOGY AGENCY;ASAHI GLASS CO LTD;SHINKOSHA:KK 发明人 KOINUMA HIDEOMI;MATSUMOTO YUJI;YAMAMOTO YUICHI;MOCHIZUKI KEISUKE;FUKUSHI DAIGO
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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