| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus capable of securely drying a substrate when drying the substrate after the substrate is treated with chemicals and pure water. SOLUTION: The substrate treating apparatus is constituted of having a chemical treating section 10 in which the substrate W is treated by using the chemicals, a pure water and dry treating section 12 in which the substrate W after being treated with the chemicals is treated by using pure water and also the substrate W after being treated with pure water is treated with first drying, a dry treating section 14 in which the substrate W after being treated in the pure water and in dry treating section 12 is treated with secondary drying, and a substrate transfer apparatus 98 with which the substrate W is transferred from the chemical treating section 10 to the pure water and dry treating section 12 and also the substrate W is transferred from the pure water and dry treating section 12 to the dry treating section 14. COPYRIGHT: (C)2005,JPO&NCIPI
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