High luminosity source for EUV lithography,申请号EP20020258588-传众专利搜索

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发明名称	High luminosity source for EUV lithography
摘要
申请公布号	EP1319988(A3)	申请公布日期	2004.10.13
申请号	EP20020258588	申请日期	2002.12.12
申请人	NIKON CORPORATION	发明人	MURAKAMI, KATSUHIKO
分类号	G21K1/06;G03F7/20;G21K5/02;H01L21/027;H05G2/00;(IPC1-7):G03F7/20	主分类号	G21K1/06
代理机构		代理人
主权项
地址

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