发明名称 Redundant via rule check in a multi-wide object class design layout
摘要 A redundant via design rule check is preferably performed on multi-wide object class design layouts to ensure that each connection area between two conductive layers has at least a certain number of vias and/or has vias placed appropriately to reduce the risk of via failure due to vacancy concentration of isolated vias. In exemplary embodiments, a redundant via design rule check preferably ensures that for vias placed within a connection area of a metal feature (or within a localized region of a larger metal geometry) that is both greater than a certain width and greater than a certain area in size, the vias are both sufficient in number and/or suitable in their location. Vias located inside a geometry but falling outside a virtual edge of a wide class object may be included to satisfy exemplary rules.
申请公布号 US6804808(B2) 申请公布日期 2004.10.12
申请号 US20020260817 申请日期 2002.09.30
申请人 SUN MICROSYSTEMS, INC. 发明人 LI MU-JING;YANG AMY
分类号 G06F17/50;(IPC1-7):G06F17/50 主分类号 G06F17/50
代理机构 代理人
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