发明名称 |
SEMICONDUCTOR COMPONENT WITH JUNCTION TERMINATION WITH HIGH BLOCKING EFFECTIVENESS |
摘要 |
An n- or p-doped semiconductor region (2) accommodates the depletion zone (21) of an active area (3) of the semiconductor component with a vertical extension dependent upon an applied blocking voltage. The junction termination (4) for the active area (3) is constituted with a semiconductor doped oppositely to the semiconductor region (2), and is arranged immediately adjacently around the active area (3) on or in a surface (20) of the semiconductor region (2). The lateral extension (W) of the junction termination (4) is greater than the maximum vertical extension (T) of the depletion zone (21), and the semiconductor region (2) as well as the junction termination (4) are constituted with a semiconductor with a band gap of at least 2 eV.
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申请公布号 |
CA2195987(C) |
申请公布日期 |
2004.10.12 |
申请号 |
CA19952195987 |
申请日期 |
1995.07.14 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
MITLEHNER, HEINZ;STEPHANI, DIETRICH;WEINERT, ULRICH |
分类号 |
H01L29/41;H01L29/06;H01L29/10;H01L29/12;H01L29/16;H01L29/20;H01L29/22;H01L29/24;H01L29/78;H01L29/861;H01L29/872;(IPC1-7):H01L29/76 |
主分类号 |
H01L29/41 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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