发明名称 SEMICONDUCTOR COMPONENT WITH JUNCTION TERMINATION WITH HIGH BLOCKING EFFECTIVENESS
摘要 An n- or p-doped semiconductor region (2) accommodates the depletion zone (21) of an active area (3) of the semiconductor component with a vertical extension dependent upon an applied blocking voltage. The junction termination (4) for the active area (3) is constituted with a semiconductor doped oppositely to the semiconductor region (2), and is arranged immediately adjacently around the active area (3) on or in a surface (20) of the semiconductor region (2). The lateral extension (W) of the junction termination (4) is greater than the maximum vertical extension (T) of the depletion zone (21), and the semiconductor region (2) as well as the junction termination (4) are constituted with a semiconductor with a band gap of at least 2 eV.
申请公布号 CA2195987(C) 申请公布日期 2004.10.12
申请号 CA19952195987 申请日期 1995.07.14
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 MITLEHNER, HEINZ;STEPHANI, DIETRICH;WEINERT, ULRICH
分类号 H01L29/41;H01L29/06;H01L29/10;H01L29/12;H01L29/16;H01L29/20;H01L29/22;H01L29/24;H01L29/78;H01L29/861;H01L29/872;(IPC1-7):H01L29/76 主分类号 H01L29/41
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