发明名称 Drain-extended MOS ESD protection structure
摘要 A protection structure (30; 30'; 30'') for safely conducting charge from electrostatic discharge (ESD) at a terminal (IN) is disclosed. The protection structure (30; 30'; 30'') includes a pair of drain-extended metal-oxide-semiconductor (MOS) transistors (32, 34). In a pump transistors (32), the gate electrode (45) overlaps a portion of a well (42) in which the drain (44) is disposed, to provide a significant gate-to-drain capacitance. The drains of the transistors (32, 34) are connected together and to the terminal (IN), while the gates of the transistors (32, 34) are connected together. The source of one transistor (32) is connected to a guard ring (50), of the same conductivity type as the substrate (40) within which the channel region of the other transistors (34) is disposed. An ESD event received at the terminal (IN) is thus coupled to the gate of the transistors (32, 34), causing conduction to the substrate (40) via the guard ring (50), and turning on a parasitic bipolar transistor at the other transistor (34), safely conducting the ESD current. One alternative structure (30') includes a junction capacitor (65) coupled between the terminal (IN) and the gates of the transistors (32, 34) to improve the coupling. Another alternative structure (30'') includes a clamping diode (92) that also presents a parasitic bipolar transistor (95) enhancing the current conducted to the substrate (40).
申请公布号 US6804095(B2) 申请公布日期 2004.10.12
申请号 US20030618893 申请日期 2003.07.14
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 KUNZ KEITH E.;DUVVURY CHARVAKA;MOSHER DAN M.
分类号 H01L27/02;H02H9/00;(IPC1-7):H02H9/00 主分类号 H01L27/02
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