| 摘要 |
An exposure apparatus for projecting a pattern on a reticle onto a substrate via projection optics to expose the substrate to the pattern. The apparatus includes a focus detection system for detecting focus of the projection optics, a barometer for measuring at least one of atmospheric pressure and ambient air pressure within the apparatus, a calibration device for calibrating the focus detection system, and a correction device. The correction device acquires a correction quantity, for correcting for a change in an image-formation characteristic ascribable to a fluctuation in air pressure of the projection optics, based upon a result of a measurement performed by the barometer during execution of the calibration, and corrects operation of the calibration device using the correction quantity.
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