发明名称 |
Semiconductor chamber process apparatus and method |
摘要 |
A semiconductor processing apparatus and method are disclosed herein, including a plurality of process chambers, wherein at least one semiconductor processing operation occurs within each process chamber among the plurality of process chambers. Additionally, the apparatus and method disclosed herein include a robot mechanism for rotating each process chamber among the plurality of process chambers upon completion of an associated semiconductor processing operation. Such a robot mechanism may comprise a plurality of robots. Specifically, such a plurality of robots may include six robots configured on an associated carousel.
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申请公布号 |
US6802935(B2) |
申请公布日期 |
2004.10.12 |
申请号 |
US20020103618 |
申请日期 |
2002.03.21 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
CHENG YI-LUNG;LIN HUI-CHI;WU SZU-AN;WANG YING-LANG |
分类号 |
B65G49/07;C23C16/44;C23C16/54;H01L21/00;(IPC1-7):B65G49/07;C23F1/00;C23C16/00 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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