发明名称 |
Apparatus and method for evaluating semiconductor material |
摘要 |
An apparatus for evaluating semiconductor material having a pump laser configured to irradiate a pump beam modulated at a modulation frequency on a semiconductor wafer, a probe laser configured to irradiate a probe beam on the semiconductor wafer, and a detector configured to detect a reflection of the probe beam from the semiconductor wafer.
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申请公布号 |
US2004196464(A1) |
申请公布日期 |
2004.10.07 |
申请号 |
US20030635539 |
申请日期 |
2003.08.07 |
申请人 |
AKUTSU HARUKO;RIKIMARU KATSUMI;SUGURO KYOICHI;SHIMA TATSUYA;KAWASE YOSHIMASA;MURAKOSHI ATSUSHI |
发明人 |
AKUTSU HARUKO;RIKIMARU KATSUMI;SUGURO KYOICHI;SHIMA TATSUYA;KAWASE YOSHIMASA;MURAKOSHI ATSUSHI |
分类号 |
H01L21/66;G01N21/17;(IPC1-7):G01N21/00 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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地址 |
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