SILICON DIOXIDE THIN-FILM AND METHOD OF MANUFACTURING THE SAME

摘要

An amorphous silicon dioxide thin-film transparent and containing a large number of pores therein, wherein a refractive index (refractive index of light with lambda = 500 nm) is in the range of 1.01 to 1.40 and the diameter of the pores which occupy 80 vol.% or more of all pores is 5 nm or shorter. Since the amorphous silicon dioxide thin-film shows low refractive index and excellent physical strengths such as high scratch resistance, the thin-film can be used advantageously for the optical thin-films of optical products used for various purposes.