发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND LITHOGRAPHIC PRINTING PLATE USING IT
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is sensitive to light in a near infrared region, can draw a picture directly on a plate with a laser beam, requires neither development nor wiping-off operation, is used for a lithographic printing plate of using dampening water in printing and excellent in hydrophilic property and plate wear, and to provide the lithographic printing plate for which the photosensitive resin composition is used. <P>SOLUTION: The photosensitive resin composition for lithographic printing comprises a hydrophilic resin, a cross linking agent, a hydrophobic resin and a light absorbing agent. The hydrophilic resin is 100-30,000 centipoise in Brookfield viscosity at 25&deg;C of 15 wt.% aqueous solution and &ge;200,000 in weight average molecular weight. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004276509(A) 申请公布日期 2004.10.07
申请号 JP20030073610 申请日期 2003.03.18
申请人 MITSUI CHEMICALS INC 发明人 TERAUCHI TOMOYA;TAKANO KOJI;SANADA TAKAYUKI;SUZUKI YUKO;NAITO MASAYA;KOIDE TETSUHIRO
分类号 G03F7/004;B41N1/14;C08F28/02;G03F7/00;G03F7/033 主分类号 G03F7/004
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