| 摘要 |
PROBLEM TO BE SOLVED: To provide a cylindrical substrate washing method capable of more reducing residual foreign matter while ensuring productivity when a cylindrical substrate such as a substrate for a photosensitive body or the like is subjected to dip-washing, and an apparatus for the dip-washing of the cylindrical substrate. SOLUTION: A washing liquid is supplied to a washing tank equipped with at least a washing liquid supply port and a washing liquid discharge end from the washing liquid supply port to fill the washing tank and, after the washing liquid supplied from the washing liquid supply port is moved at least in an almost vertical direction, the cylindrical substrate is dipped in the washing liquid in its almost axial direction and washed while the washing liquid being discharged. In the cylindrical substrate washing method, the washing liquid discharge end is provided at a position approaching the first and second regions, which are set to an almost opposite positional relation equal in distance at least with respect to the center axis of the cylindrical substrate, on the cylindrical surface of the cylindrical substrate dipped in the washing tank. COPYRIGHT: (C)2005,JPO&NCIPI
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