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发明名称
PLANARISIERUNGSVERFAHREN FÜR HALBLEITENDE SUBSTRATE
摘要
申请公布号
DE69820662(T2)
申请公布日期
2004.10.07
申请号
DE19986020662T
申请日期
1998.05.21
申请人
MICRON TECHNOLOGY, INC.
发明人
DOAN, T.;BLALOCK, T.;DURCAN, MARK;MEIKLE, G.
分类号
H01L21/304;H01L21/3105;(IPC1-7):H01L21/302;B05D3/00;B05D3/12;H01B13/00;B44C1/22;H01L21/310;H01L21/768
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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