| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition system by which film deposition can simply and securely be performed while reducing an environmental load at a low energy and at a low cost. SOLUTION: The film deposition method for depositing a film on the surface 21 of the object 20 to be film-deposited comprises: a coating step where a surface 21 is coated with a coating liquid 45 obtained by dispersing metal fine particles 48 into a solvent 49; and a light irradiation step where the coating liquid 45 is irradiated with light 77 of a short pulse having high light strength from a light irradiation part 33 so as to heat the coating liquid 45 and the surface 21, and the solvent 49 is evaporated, so that the metallic fine particles 48 are melted to deposit a metallic film 90. COPYRIGHT: (C)2005,JPO&NCIPI
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