THIN FILM MANUFACTURING METHOD, AND PARTICLE DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To realize patterning of high accuracy while reducing the cost and time required for the entire process, and selectively depositing particles in the nano-order. SOLUTION: In a thin film manufacturing method in which at least particles are deposited on a surface of a substrate, by focusing attention on the fact that particle deposition is induced by the light irradiated with nuclei of the nano-meter size as so-called starting points, particles are deposited on the surface of the substrate with nuclei of the nano-meter size formed thereon in advance and irradiated with the light, and the particles are selectively deposited by controlling the irradiated light. COPYRIGHT: (C)2005,JPO&NCIPI