发明名称 Method and apparatus for laser ablative modification of dielectric surfaces
摘要 The present invention provides a method and apparatus (100) for laser (101) ablative modification of surfaces (120). The apparatus (100) includes a controller adapted to determine the wavelength corresponding to a characteristic wavelength of the absorption band, as well as an intensity and a duration such that a light pulse with the determined wavelength, intensity, and duration is capable of heating the portion of the dielectric material (120) to approximately the critical temperature of the dielectric material on a time scale less than about the characteristic time scale for thermal diffusion in the dielectric material and thereby inducing a phase explosion in the dielectric material. The apparatus further includes a laser (101) capable of providing at least one light pulse with the determined wavelength, intensity and duration in response to a signal from the controller.
申请公布号 US2004195221(A1) 申请公布日期 2004.10.07
申请号 US20040476687 申请日期 2004.05.17
申请人 HAGLUND JR RICHARD F.;ERMER DAVID 发明人 HAGLUND JR RICHARD F.;ERMER DAVID
分类号 B23K26/06;B23K26/073;B23K26/40;B28D1/22;C03B23/00;C03B23/02;C03B33/08;C03C15/00;C03C23/00;G02B6/36;H01L21/48;(IPC1-7):B23K26/40 主分类号 B23K26/06
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