LASER BEAM IRRADIATION UNIT, LASER BEAM IRRADIATION METHOD, AND METHOD OF MANUFACTURING LASER BEAM IRRADIATION SYSTEM AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a laser beam irradiation unit which can constantly perform a kinetic energy of a laser beam for a long time, a laser processing method and a method of manufacturing a semiconductor device.

SOLUTION: A laser beam irradiation unit according to the present invention includes: a laser oscillator; plural attenuators; an optical system; a temperature control chamber or a humidity control chamber; a process chamber; and a primary transfer unit. After an attenuator provided between the laser oscillator and the optical system is changed to an attenuator in the humidity control chamber by the primary transfer unit, a laser beam is ejected from the laser oscillator and an energy of the laser beam is attenuated by the attenuator to irradiate the laser beam to an irradiated object.

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