发明名称 HIGH STRENGTH POLYCRYSTALLINE SILICON AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a polycrystalline silicon rod having high strength and excellent cracking resistance. SOLUTION: In the process of manufacturing a polycrystalline silicon rod from silanes as the source material by Siemens method, the surface temperature of the rod is controlled to the range of 950 to 1,010°C and the supply amount of the source material gas per unit surface area of the rod is controlled to the range of 3.5×10<SP>-4</SP>to 7.0×10<SP>-4</SP>mol/cm<SP>2</SP>min. The tensile strength of the rod in the longitudinal direction at ordinary temperature and at 800°C can be maintained to be≥90 MPa. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004277223(A) 申请公布日期 2004.10.07
申请号 JP20030071277 申请日期 2003.03.17
申请人 SUMITOMO TITANIUM CORP 发明人 OCHIAI SANJI
分类号 C01B33/035;C30B29/06;(IPC1-7):C01B33/035 主分类号 C01B33/035
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