| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which shows sufficient transmittance when a light source of ≤160 nm wavelength, specifically when F<SB>2</SB>excimer laser light (157 nm) is used, and exhibits excellent coating uniformity, dry etching durability, line edge roughness and developing performance. <P>SOLUTION: The positive resist composition contains a resin which has a specified repeating unit and of which the solubility in an alkaline developing solution increases in the presence of an acid; and a compound which generates an acid by the action of active rays or radiation. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
