发明名称 PHASE SHIFT MASK
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a phase shift ask in which the shift amount of the phase and the transmittance of the light transmitting through a transmittance controlling part can be easily controlled and which can be easily manufactured, and thereby can be manufactured at low cost. <P>SOLUTION: The phase shift mask comprises: a transparent substrate; a light transmitting region formed on the transparent substrate; a phase shift region which substantially inverses the phase of the transmitted light with respect to the above light transmitting region; and a transmittance controlling region which generates the same phase as the phase of the transmitted light in the above transmitting region and controls the transmittance to be different from the light transmitting region. The transmittance controlling region is formed by disposing a transmittance controlling part with tantalum as a major component on the transparent substrate. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004279484(A) 申请公布日期 2004.10.07
申请号 JP20030067224 申请日期 2003.03.12
申请人 DAINIPPON PRINTING CO LTD 发明人 HIROTA MEGUMI;SASAKI SHIHO;NOGUCHI KENJI;MOTONAGA TOSHIAKI;SUZUKI KATSUTOSHI;TABEI MOTOHARU
分类号 G03F1/29;G03F1/32;G03F1/68;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/29
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