METHOD AND APPARATUS FOR IRRADIATING LASER, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for irradiating laser light with which a crystalline defective region formed on a semiconductor film can be minimized, and provide a manufacturing method of a semiconductor device. SOLUTION: According to the present invention, a long crystal grain region is formed on a semiconductor film while suppressing the formation of the crystalline defective region by subsidiarily radiating a fundamental wave for harmonic waves. There is included another aspect of the present invention where a part of a beam spot of the higher harmonics having lower energy density on an irradiation surface is irradiated with a part of a beam spot of the fundamental wave having higher energy density. COPYRIGHT: (C)2005,JPO&NCIPI