发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a cleaning technology which can substantially reduce contamination of a workpiece. SOLUTION: An inside of a treatment chamber is coated with the same matter to the workpiece, or, with a matter of a diffusion coefficient larger than that of the matter. Then, a contaminated substance inside the treatment chamber is introduced into a coated film by heating the treatment chamber. The sufficiently contaminated coated-film is then removed from the treatment chamber. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004281979(A) 申请公布日期 2004.10.07
申请号 JP20030075046 申请日期 2003.03.19
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 OOURA YOSHITAKA
分类号 C23C16/24;C23C16/44;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C23C16/24
代理机构 代理人
主权项
地址