| 摘要 |
PROBLEM TO BE SOLVED: To efficiently form a carbon nitride composition which gives a film having high gas barrier properties, stability, a high ability to coat, and high adhesion even when it is formed into the film at a low temperature. SOLUTION: The carbon nitride composition can maintain stability and stress relaxation properties though it is formed into a film at a film formation temperature, e.g., 100°C or below, desirably, 50°C or below, more desirably, 20 to 30°C, at which the composition can contain 30 to 45 atomic% hydrogen. COPYRIGHT: (C)2005,JPO&NCIPI
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