发明名称 |
POSITION CONTROLLING MECHANISM OF PELLICLE STRUCTURE FOR SECURING TRANSFER-PRECISION AND EXPOSING METHOD |
摘要 |
<p>PURPOSE: A position controlling mechanism of a pellicle structure and an exposing method are provided to secure transfer-precision by preventing the pellicle structure from being warped and vibrated using a position correcting part and an air-flow rectifying part. CONSTITUTION: A position controlling mechanism of a pellicle structure(2) includes a position correcting part and an air-flow rectifying part. The pellicle structure includes a pellicle layer(3). The position correcting part(10) is used for correcting a surface of the pellicle layer to a predetermined height with a measuring portion and a pressure controlling portion. The air-flow rectifying part(11) is used for rectifying the air-flow generated at a portion adjacent to the surface of the pellicle layer.</p> |
申请公布号 |
KR20040084979(A) |
申请公布日期 |
2004.10.07 |
申请号 |
KR20040020559 |
申请日期 |
2004.03.26 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. |
发明人 |
HIGASHIKAWA IWAO |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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