发明名称 POSITION CONTROLLING MECHANISM OF PELLICLE STRUCTURE FOR SECURING TRANSFER-PRECISION AND EXPOSING METHOD
摘要 <p>PURPOSE: A position controlling mechanism of a pellicle structure and an exposing method are provided to secure transfer-precision by preventing the pellicle structure from being warped and vibrated using a position correcting part and an air-flow rectifying part. CONSTITUTION: A position controlling mechanism of a pellicle structure(2) includes a position correcting part and an air-flow rectifying part. The pellicle structure includes a pellicle layer(3). The position correcting part(10) is used for correcting a surface of the pellicle layer to a predetermined height with a measuring portion and a pressure controlling portion. The air-flow rectifying part(11) is used for rectifying the air-flow generated at a portion adjacent to the surface of the pellicle layer.</p>
申请公布号 KR20040084979(A) 申请公布日期 2004.10.07
申请号 KR20040020559 申请日期 2004.03.26
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 发明人 HIGASHIKAWA IWAO
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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