发明名称 ELECTRON BEAM IRRADIATION DEVICE AND IRRADIATION METHOD OF ELECTRON BEAM
摘要 PROBLEM TO BE SOLVED: To maintain a right posture and high vacuum even if a local vacuum pad is separated from a specimen when an outermost circumference of the specimen is measured. SOLUTION: An electron beam irradiation device is provided with an arrangement means by which a flat satellite stage 17 installed at a circumference or at a part of the circumference of a workpiece 3 with its height equalized to that of the surface of the workpiece, and a sealing means to seal a gap between the satellite stage 17 and the workpiece 3 in close contact. By this, in a partial vacuum device, working can be carried out up to the outer peripheral part of the workpiece 3 with a posture of a static pressure floating pad maintained while the vacuum state of the static pressure floating pad is maintained. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004281141(A) 申请公布日期 2004.10.07
申请号 JP20030068771 申请日期 2003.03.13
申请人 SONY CORP 发明人 MUTO KOICHI;AKI YUICHI;TAKAYAMA MASATO;HATTORI TADASHI;OKAWACHI HIROKI;TAKEDA MINORU
分类号 G21K5/04;G21K5/10;H01J37/18;H01J37/20;(IPC1-7):H01J37/18 主分类号 G21K5/04
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