| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching apparatus capable of precisely etching by improving variations in an etching speed. SOLUTION: The etching apparatus has nozzles 3, 5 and devices 2, 4, 6, and 7-13. The nozzles 3, 5 reciprocate in a direction for crossing the conveyance direction of an etching material 1 for jetting out etching liquid to a material 1 to be etched traveling linearly. The devices 2, 4, 6, and 7-13 move the nozzles at a constant velocity. COPYRIGHT: (C)2005,JPO&NCIPI
|
