发明名称 |
DEFECT INSPECTING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspecting apparatus for minimizing the pattern shape change of a target to be inspected and keeping response in reviewing when laser beams are used as a light source. SOLUTION: The defect inspecting apparatus has a laser source 3, and a linear sensor 13 for detecting reflection light from a sample 1 irradiated with laser beams emitted from the laser source 3 and an observation camera 24 for acquiring defect inspection images for detecting defects on the sample by the linear sensor and acquiring the observation images of the samples by the observation camera. A CPU 19 acquires great functionary inspection images by the linear sensor 13 and acquires observation images by the observation camera 24. The observation images acquired by the observation camera 24 are stored in a storage device 20. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004279036(A) |
申请公布日期 |
2004.10.07 |
申请号 |
JP20030066585 |
申请日期 |
2003.03.12 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
ONO TAKAMICHI;SUZUKI TADASHI;IIZUKA MASAMI |
分类号 |
G01N21/956;H01L21/66;(IPC1-7):G01N21/956 |
主分类号 |
G01N21/956 |
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