发明名称 OPTICAL SYSTEM AND ALIGNER USING THE SAME, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To solve the problem that since a mirror optical system used in an EUV aligner has the reflectivity of about 70% with respect to EUV light, it absorbs EUV light, followed by a large deformation. SOLUTION: The optical system includes at least one optical element in an internal space and guides the light from a light source to a prescribed surface. The optical system comprises a measuring system for measuring a surface profile of the optical element, and a temperature controlling section for controlling the temperature of the optical system based on the results from the measuring system. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004281653(A) 申请公布日期 2004.10.07
申请号 JP20030070036 申请日期 2003.03.14
申请人 CANON INC 发明人 HARA SHINICHI
分类号 G02B17/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B17/00
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