SUBSTRATE WITH DESIRED ROUGHNESS FOR PHOTO MASK, PHOTO MASK BLANK AND PHOTO MASK

摘要

PURPOSE: A substrate for a photo mask, a photo mask blank and the photo mask are provided to restrain particles from being generated at a side portion of the substrate and to handle easily the substrate without slides by controlling properly the roughness of an end surface and a chamfered surface of the substrate. CONSTITUTION: A substrate for a photo mask includes a main surface composed of a front surface and a rear surface, an end surface(T), and chamfered surfaces(C) between the end surface and the main surface. Each roughness of the end surface and the chamfered surface is within a range of 0.03 to 0.3 μm.