EXPOSURE APPARATUS TO ALLOW IMAGE OF SPACE LIGHT MODULATION DEVICE TO BE PRECISELY PROJECTED ON IMAGE FORMATION SURFACE BY PREVENTING OFFSET OF POSITION OF MICRO-LENS

摘要

PURPOSE: An exposure apparatus is provided, to allow the image of a space light modulation device to be precisely projected on an image formation surface by preventing the offset of position of micro-lens. CONSTITUTION: The exposure apparatus comprises a light source(12); a space light modulation device where a plurality of pixel parts whose light modulation state is changed according to each control signal are two-dimensionally arranged and which modulates the light beam incident on the pixel parts from the light source at each pixel part; a micro-lens array(18) where a plurality of micro-lenses with a pitch corresponding to the pixel parts are two-dimensionally arranged and which condenses the light beam modulated by the pixel parts at each micro-lens; an offset amount detection means which detect the amount of offset of the relative position of the micro-lens corresponding to the light beam modulated by the pixel parts; and a position control means(32, 38) which finely controls the position of at least one side between the space light modulation device and the micro-lens array based on the detected offset amount.