摘要 |
PURPOSE: A design method of a semiconductor device is provided to prevent side-lobe due to constructive interference of light source by using a layout rule based on space and size. CONSTITUTION: An independence pattern composed of a conductive layer is designed to a rectangle structure. A side length of one axial in sides of X-axis and Y-axis directions of the rectangle structure is designed to 2λ or 3λ, and a side length of the other axial is designed to 5λ and over, wherein λ is wavelength used in photolithographic processing.
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