发明名称 X-RAY DIFFRACTION DEVICE FOR MEASURING IN-PLANE DIFFRACTION OF X-RAY
摘要 PURPOSE: An X-ray diffraction device is provided to perform in-plane diffraction measurement by rotating a light receiving optical system around a first rotational center line while the normal of a sample is vertical to the first rotational center line. CONSTITUTION: An X-ray diffraction device comprises an incident optical system(22), a sample support mechanism(24), a light receiving optical system(26), and a light receiving optical system rotating unit(30). The X-ray emitted from the incident optical system is incident to a sample(60) supported on the sample support mechanism and diffracted in the sample. The diffracted X-ray is detected by the light receiving optical system. The incident optical system has an X-ray source(66) and a multi-layer mirror. Stance control units(36,40) of the sample support mechanism maintain the normal of the sample parallel to a first rotational center line(32) and vertical to the first rotational center line.
申请公布号 KR20040084849(A) 申请公布日期 2004.10.06
申请号 KR20040020425 申请日期 2004.03.25
申请人 RIGAKU CORPORATION 发明人 OMOTE KAZUHIKO
分类号 G01N23/207;G01N23/20;G21K1/06;(IPC1-7):G01N23/207 主分类号 G01N23/207
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