发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured by said method |
摘要 |
On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements. <IMAGE> |
申请公布号 |
EP1146395(A3) |
申请公布日期 |
2004.10.06 |
申请号 |
EP20010303299 |
申请日期 |
2001.04.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SCHEIBERLICH, ARIE CORNELIS;FIEN, MENNO;DRAAIJER, EVERT HENDRIK JAN |
分类号 |
G03F7/20;G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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