| 发明名称 |
Germanium compounds suitable for use in vapor deposition processes |
| 摘要 |
<p>Germanium compounds suitable for use as vapor phase deposition precursors for germanium films are provided. Methods of depositing films containing germanium using such compounds are also provided. Such germanium films are particularly useful in the manufacture of electronic devices.</p> |
| 申请公布号 |
EP1464725(A2) |
申请公布日期 |
2004.10.06 |
| 申请号 |
EP20040251949 |
申请日期 |
2004.04.01 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
WOELK, EGBERT;SHENAI-KHATKHATE, DEODATTA VINAYAK |
| 分类号 |
C23C16/08;C23C16/22;C07F7/08;C07F7/30;C23C16/18;C23C16/28;C23C16/30;H01L21/205;(IPC1-7):C23C16/22 |
主分类号 |
C23C16/08 |
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