METHOD FOR FABRICATING ARRAY SUBSTRATE FOR TFT LCD FOR REDUCING MASK AND ETCHING STEPS

摘要

PURPOSE: A method for fabricating an array substrate for a TFT LCD is provided to simplify the fabricating procedure by reducing the numbers of mask and the etching steps. CONSTITUTION: In a method for fabricating an array substrate for a TFT LCD, a photosensitive film on a protecting film(6) is exposed by using a photo mask having a light blocking area corresponding to gate and data line forming areas, a light semi-transmitting area corresponding to pixel areas, and a light transmitting area corresponding to via hole forming areas. While exposing via the hole forming areas for exposing source/drain electrodes(5) by developing the photosensitive film, a photosensitive film pattern is formed with a small thickness for the areas corresponding to pixel areas. By etching the protecting film through the photosensitive film serving as an etching mask, via holes for exposing the source/drain electrodes are formed. A residual photosensitive film pattern having an inverse taper angle is formed on pixel areas by photosensitive film ashing. After depositing an ITO metal layer, the residual photosensitive film pattern is removed together with the deposited ITO metal film by photosensitive film strip process, thereby pixel electrodes(9a) are formed on the pixel areas.