发明名称 Apparatus and method for focusing light beam and exposure apparatus
摘要 Focusing method and exposure apparatus for focusing both a parallel light beam (16) and a non-parallel light beam (16) through a movable objective lens (3) onto an object (4). A negative feedback loop is provided which has a detector (6) for receiving a reflection light beam (5) of the non-parallel light beam (2) passed through the movable objective lens (3), reflected at the object (4) and passed through the movable objective lens (3), for generating a detection signal (6a, 6b) corresponding to a focus deviation of the non-parallel light beam (2), and a driver (9) for receiving the detection signal to control a position of the movable objective lens (3) in accordance with the detection signal (8), so that the detection signal is decreased. The negative feedback loop further includes a correction signal generator (13) for generating a correction signal (14) and supplying it to the negative feedback loop as a disturbance of the loop so that the parallel light beam is focused onto the object. <IMAGE>
申请公布号 EP1276102(A3) 申请公布日期 2004.10.06
申请号 EP20020251361 申请日期 2002.02.27
申请人 HITACHI, LTD. 发明人 YANAGI, MASAHI;KIMURA, NOBUO;ANDOU, TETSUO;NAKAMOTO, HIDEKAZU
分类号 G11B7/09;G11B7/00;G11B7/095;G11B7/125;G11B7/26 主分类号 G11B7/09
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