发明名称 APPARATUS FOR MANUFACTURING THIN FILM BY MOUNTING SHUTTER UNIT INSIDE DEPOSITION CHAMBER
摘要 PURPOSE: An apparatus for manufacturing a thin film is provided to obtain a uniform coated large-scale substrate and secure uniformity of a thin film in-situ during depositing process by mounting a shutter unit inside a deposition chamber. CONSTITUTION: An apparatus for manufacturing a thin film comprises an upper chamber(10); a lower chamber(30); and a shutter unit(40). A substrate loading gate valve(14) and a substrate unloading gate valve(16) are connected to the both sides of the upper chamber and a substrate to be treated is transferred and loaded to the upper chamber. A sidewall(20) having a window is interposed between the upper chamber and the lower chamber and a linear evaporation source(32) is installed into the lower chamber. The shutter unit is mounted at least one of lateral walls for adjusting area of the window.
申请公布号 KR20040084057(A) 申请公布日期 2004.10.06
申请号 KR20030018858 申请日期 2003.03.26
申请人 NESS DISPLAY CO., LTD. 发明人 KIM, SIN CHEOL;LEE, JAE GYEONG
分类号 H05B33/10;(IPC1-7):H05B33/10 主分类号 H05B33/10
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