发明名称 |
APPARATUS FOR MANUFACTURING THIN FILM BY MOUNTING SHUTTER UNIT INSIDE DEPOSITION CHAMBER |
摘要 |
PURPOSE: An apparatus for manufacturing a thin film is provided to obtain a uniform coated large-scale substrate and secure uniformity of a thin film in-situ during depositing process by mounting a shutter unit inside a deposition chamber. CONSTITUTION: An apparatus for manufacturing a thin film comprises an upper chamber(10); a lower chamber(30); and a shutter unit(40). A substrate loading gate valve(14) and a substrate unloading gate valve(16) are connected to the both sides of the upper chamber and a substrate to be treated is transferred and loaded to the upper chamber. A sidewall(20) having a window is interposed between the upper chamber and the lower chamber and a linear evaporation source(32) is installed into the lower chamber. The shutter unit is mounted at least one of lateral walls for adjusting area of the window.
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申请公布号 |
KR20040084057(A) |
申请公布日期 |
2004.10.06 |
申请号 |
KR20030018858 |
申请日期 |
2003.03.26 |
申请人 |
NESS DISPLAY CO., LTD. |
发明人 |
KIM, SIN CHEOL;LEE, JAE GYEONG |
分类号 |
H05B33/10;(IPC1-7):H05B33/10 |
主分类号 |
H05B33/10 |
代理机构 |
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主权项 |
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地址 |
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