| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
<p>In a projection system for EUV, the positions of mirrors (M1-M6) are measured and controlled relative to each other, rather than to a reference frame. Relative position measurements may be made by interferometers or capacitive sensors (IF3-IF9) mounted on rigid extensions of the mirrors. <IMAGE></p> |
| 申请公布号 |
EP1465015(A1) |
申请公布日期 |
2004.10.06 |
| 申请号 |
EP20040251739 |
申请日期 |
2004.03.25 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
COX, H.H.M.;FRANKEN, D.J.P.A.;KEMPER, N.R.;VAN DER PASCH, E.A.F.;VERBUNT, M.J.;VAN DEN WILDENBERG, L.A. |
| 分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 地址 |
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