发明名称 |
Substrate independent superpolishing process and slurry |
摘要 |
The present invention utilizes a combination of chemical and mechanical finishing processes to polish a disk substrate surface to near atomic smoothness. Broadly speaking, the surface of a disk substrate that has been machined (i.e., rough ground) to a predetermined surface roughness is subjected to attack by a chemical formulation (called an attacking agent). The chemical formulation is used to soften the substrate material. Then, the softened material is "wiped away" via mechanical action.
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申请公布号 |
US6801396(B1) |
申请公布日期 |
2004.10.05 |
申请号 |
US19970964686 |
申请日期 |
1997.11.05 |
申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.B. |
发明人 |
DEN HARTOG BRENT RAY;FOX DENNIS LEONARD;HAGAN JAMES ALOYSIUS;SHEN JOHN CHEN;VISWANATHAN KANNIMANGALAM VENKATASUBRAMANYAM |
分类号 |
B24B37/00;C23F1/16;G11B5/73;G11B5/82;G11B5/84;H01L21/304;(IPC1-7):G11B5/82 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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